Publication:

Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.3.033201
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dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHansen, Steven G.
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.orcidimecDe Bisschop, Peter::0000-0002-8297-5076
dc.date.accessioned2023-04-06T13:40:09Z
dc.date.available2022-10-29T02:58:14Z
dc.date.available2023-04-06T13:40:09Z
dc.date.embargo2022-08-08
dc.date.issued2022
dc.identifier.doi10.1117/1.JMM.21.3.033201
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40632
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 033201
dc.source.endpagena
dc.source.issue3
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages24
dc.source.volume21
dc.subject.keywordsLINE-EDGE ROUGHNESS
dc.title

Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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