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Elevated source/drain by sacrificial selective epitaxy for high performance deep submicron CMOS: process window versus complexity
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Authors
Augendre, Emmanuel
;
Rooyackers, Rita
;
Caymax, Matty
;
Vandamme, Ewout
;
De Keersgieter, An
;
Perello, Carles
;
Van Dievel, Marc
;
Pochet, Sandrine
;
Badenes, Gonçal
Issue
7
Journal
IEEE Trans. Electron Devices
Volume
47
Title
Elevated source/drain by sacrificial selective epitaxy for high performance deep submicron CMOS: process window versus complexity
Publication type
Journal article
Embargo date
9999-12-31
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