dc.contributor.author | Soltwisch, V. | |
dc.contributor.author | Glabisch, S. | |
dc.contributor.author | Andrle, A. | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Saadeh, Q. | |
dc.contributor.author | Schroder, S. | |
dc.contributor.author | Lohr, L. | |
dc.contributor.author | Ciesielski, R. | |
dc.contributor.author | Brose, S. | |
dc.date.accessioned | 2023-06-01T14:03:06Z | |
dc.date.available | 2022-12-11T03:11:08Z | |
dc.date.available | 2023-06-01T14:03:06Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-6049-6 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000890070800011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40862.2 | |
dc.source | WOS | |
dc.title | High-precision optical constants characterization of materials in the EUV spectral range: From large research facilities to laboratory-based instruments | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/12.2640176 | |
dc.identifier.eisbn | 978-1-5106-6050-2 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.conference | 37th European Mask and Lithography Conference | |
dc.source.conferencedate | JUN 20-23, 2022 | |
dc.source.conferencelocation | Leuven | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12472 | |
imec.availability | Published - imec | |
dc.description.wosFundingText | The authors acknowledge that this project has received funding from the Electronic Component Systems for European Leadership Joint Undertaking under grant agreement 783247-TAPES3, as well as from the EMPIR programme 20IND04 ATMOC. These Joint Undertakings receive support from the European Union's Horizon 2020 research and innovation program alongside the Netherlands, France, Belgium, Germany, Czech Republic, Austria, Hungary, and Israel. | |