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High-precision optical constants characterization of materials in the EUV spectral range: From large research facilities to laboratory-based instruments
dc.contributor.author | Soltwisch, V. | |
dc.contributor.author | Glabisch, S. | |
dc.contributor.author | Andrle, A. | |
dc.contributor.author | Philipsen, V. | |
dc.contributor.author | Saadeh, Q. | |
dc.contributor.author | Schroder, S. | |
dc.contributor.author | Lohr, L. | |
dc.contributor.author | Ciesielski, R. | |
dc.contributor.author | Brose, S. | |
dc.date.accessioned | 2022-12-11T03:11:08Z | |
dc.date.available | 2022-12-11T03:11:08Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-6049-6 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000890070800011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40862 | |
dc.source | WOS | |
dc.title | High-precision optical constants characterization of materials in the EUV spectral range: From large research facilities to laboratory-based instruments | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Philipsen, V. | |
dc.identifier.doi | 10.1117/12.2640176 | |
dc.identifier.eisbn | 978-1-5106-6050-2 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.conference | 37th European Mask and Lithography Conference | |
dc.source.conferencedate | JUN 20-23, 2022 | |
dc.source.conferencelocation | Leuven | |
dc.source.volume | 12472 | |
imec.availability | Under review |
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