dc.contributor.author | Lee, Tsu-Ting | |
dc.contributor.author | Chiranjeevulu, Kashi | |
dc.contributor.author | Pedaballi, Sireesha | |
dc.contributor.author | Cott, Daire | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Dee, Chang-Fu | |
dc.contributor.author | Chang, Edward Yi | |
dc.date.accessioned | 2023-06-30T13:35:22Z | |
dc.date.available | 2022-12-17T03:12:15Z | |
dc.date.available | 2023-06-30T13:35:22Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 0734-2101 | |
dc.identifier.other | WOS:000892343300001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40884.2 | |
dc.source | WOS | |
dc.title | Nucleation and growth mechanism for atomic layer deposition of Al2O3 on two-dimensional WS2 monolayer | |
dc.type | Journal article | |
dc.contributor.imecauthor | Cott, Daire | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
dc.contributor.orcidimec | Cott, Daire::0009-0000-0890-8820 | |
dc.date.embargo | 2023-01-31 | |
dc.identifier.doi | 10.1116/6.0001913 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art.: 013201 | |
dc.source.endpage | na | |
dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | |
dc.source.issue | 1 | |
dc.source.volume | 41 | |
imec.availability | Published - open access | |
dc.description.wosFundingText | This work was financially supported by the "Center for the Semiconductor Technology Research" from The Featured Areas Research Center Program within the framework of the Higher Education Sprout Project by the Ministry of Education (MOE) in Taiwan. Also, it is supported in part by the Ministry of Science and Technology, Taiwan, under Grant Nos. MOST 110-2634-F-009-027 and 110-2622-8-009-018-SB and by the National Chung-Shan Institute of Science and Technology, Taiwan, under No. NCSIST-403-V309(110). | |