dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Van Hove, Marleen | |
dc.contributor.author | Mannaert, Geert | |
dc.contributor.author | Vanhaelemeersch, Serge | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-14T12:40:13Z | |
dc.date.available | 2021-10-14T12:40:13Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4092 | |
dc.source | IIOimport | |
dc.title | Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Mannaert, Geert | |
dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1281 | |
dc.source.endpage | 1287 | |
dc.source.journal | J. Vacuum Science and Technology B | |
dc.source.issue | 3 | |
dc.source.volume | 18 | |
imec.availability | Published - open access | |