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dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorWallinga, H.
dc.contributor.authorWoerlee, P.
dc.date.accessioned2021-10-14T12:40:23Z
dc.date.available2021-10-14T12:40:23Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4099
dc.sourceIIOimport
dc.titleBreakdown and recovery of thin gate oxides
dc.typeJournal article
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageL582
dc.source.endpageL584
dc.source.journalJapanese Journal of Applied Physics. Part 2: Letters
dc.source.issue6B
dc.source.volume39
imec.availabilityPublished - open access


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