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Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
dc.contributor.author | Sarkar, Sujan K. K. | |
dc.contributor.author | Das, Sayantan | |
dc.contributor.author | Carballo, Victor M. Blanco | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Halder, Sandip | |
dc.date.accessioned | 2023-03-01T03:27:45Z | |
dc.date.available | 2023-03-01T03:27:45Z | |
dc.date.issued | 2022-OCT 1 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000924949300030 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41203 | |
dc.source | WOS | |
dc.title | Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study | |
dc.type | Journal article | |
dc.contributor.imecauthor | Sarkar, Sujan K. K. | |
dc.contributor.imecauthor | Das, Sayantan | |
dc.contributor.imecauthor | Carballo, Victor M. Blanco | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.identifier.doi | 10.1117/1.JMM.21.4.044901 | |
dc.source.numberofpages | 17 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 4 | |
dc.source.volume | 21 | |
imec.availability | Under review |
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