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Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers
dc.contributor.author | Poonkottil, Nithin | |
dc.contributor.author | Rijckaert, Hannes | |
dc.contributor.author | Rajendran, Khannan | |
dc.contributor.author | Petit, Robin R. | |
dc.contributor.author | Martin, Lisa I. D. J. | |
dc.contributor.author | Van Thourhout, Dries | |
dc.contributor.author | Van Driessche, Isabel | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Dendooven, Jolien | |
dc.date.accessioned | 2023-03-17T03:38:46Z | |
dc.date.available | 2023-03-17T03:38:46Z | |
dc.date.issued | 2023-FEB 15 | |
dc.identifier.issn | 2196-7350 | |
dc.identifier.other | WOS:000936702100001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41299 | |
dc.source | WOS | |
dc.title | Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers | |
dc.type | Journal article | |
dc.type | Journal article (pre-print) | |
dc.contributor.imecauthor | Rajendran, Khannan | |
dc.contributor.imecauthor | Van Thourhout, Dries | |
dc.contributor.orcidimec | Van Thourhout, Dries::0000-0003-0111-431X | |
dc.identifier.doi | 10.1002/admi.202201934 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.journal | ADVANCED MATERIALS INTERFACES | |
imec.availability | Under review |