dc.contributor.author | Hasan, Mahmudul | |
dc.contributor.author | Beral, Christophe | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Moussa, Alain | |
dc.contributor.author | Van den Heuvel, Dieter | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Leray, Philippe | |
dc.date.accessioned | 2023-06-05T14:50:52Z | |
dc.date.available | 2023-03-22T03:40:57Z | |
dc.date.available | 2023-06-05T14:50:52Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000944102600021 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41328.3 | |
dc.source | WOS | |
dc.title | Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hasan, Mahmudul | |
dc.contributor.imecauthor | Beral, Christophe | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Moussa, Alain | |
dc.contributor.imecauthor | Van den Heuvel, Dieter | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
dc.identifier.doi | 10.1117/12.2641768 | |
dc.identifier.eisbn | 978-1-5106-5640-6 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 122920M | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 26-29, 2022 | |
dc.source.conferencelocation | Monterey | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12292 | |
imec.availability | Published - imec | |