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Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning

dc.contributor.authorHasan, Mahmudul
dc.contributor.authorBeral, Christophe
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorMoussa, Alain
dc.contributor.authorVan den Heuvel, Dieter
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.date.accessioned2023-06-05T14:50:52Z
dc.date.available2023-03-22T03:40:57Z
dc.date.available2023-06-05T14:50:52Z
dc.date.issued2022
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000944102600021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41328.3
dc.sourceWOS
dc.titleInfluence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning
dc.typeProceedings paper
dc.contributor.imecauthorHasan, Mahmudul
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorVan den Heuvel, Dieter
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.identifier.doi10.1117/12.2641768
dc.identifier.eisbn978-1-5106-5640-6
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpage122920M
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12292
imec.availabilityPublished - imec


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320.500.12860/41328.3*2023-06-05T14:49:18Zvalidation by library/open access desk
120.500.12860/413282023-03-22T03:40:57Z

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