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Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser

dc.contributor.authorZidan, Mohamed
dc.contributor.authorDey, Bappaditya
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSeveri, Joren
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLorusso, Gian
dc.date.accessioned2023-04-12T10:34:09Z
dc.date.available2023-03-22T03:41:00Z
dc.date.available2023-03-24T08:14:45Z
dc.date.available2023-04-12T10:34:09Z
dc.date.issued2022
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000944102600017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41333.3
dc.sourceWOS
dc.titleExtraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser
dc.typeProceedings paper
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.identifier.doi10.1117/12.2643315
dc.identifier.eisbn978-1-5106-5640-6
dc.source.numberofpages13
dc.source.peerreviewyes
dc.source.beginpage1229201
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalSPIE Photomask Technology + EUV Lithography 2022
dc.source.volume12292
imec.availabilityPublished - imec


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320.500.12860/41333.3*2023-04-12T10:31:47Zvalidation by library/open access desk
220.500.12860/41333.22023-03-24T08:12:59Zvalidation by imec author
120.500.12860/413332023-03-22T03:41:00Z

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