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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
dc.contributor.author | Dinh, Cong Que | |
dc.contributor.author | Nagahara, Seiji | |
dc.contributor.author | Kuwahara, Yuhei | |
dc.contributor.author | Dauendorffer, Arnaud | |
dc.contributor.author | Yoshida, Keisuke | |
dc.contributor.author | Okada, Soichiro | |
dc.contributor.author | Onitsuka, Tomoya | |
dc.contributor.author | Kawakami, Shinichiro | |
dc.contributor.author | Shimura, Satoru | |
dc.contributor.author | Muramatsu, Makoto | |
dc.contributor.author | Yoshihara, Kosuke | |
dc.contributor.author | Petersen, John S. | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Huli, Lior | |
dc.contributor.author | Grzeskowiak, Steven | |
dc.contributor.author | Krawicz, Alexandra | |
dc.contributor.author | Bae, Nayoung | |
dc.contributor.author | Kato, Kanzo | |
dc.contributor.author | Nafus, Kathleen | |
dc.contributor.author | Raley, Angelique | |
dc.date.accessioned | 2023-04-30T04:07:33Z | |
dc.date.available | 2023-04-30T04:07:33Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 0914-9244 | |
dc.identifier.other | WOS:000960586000014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41520 | |
dc.source | WOS | |
dc.title | EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing | |
dc.type | Journal article | |
dc.contributor.imecauthor | Petersen, John S. | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.2494/photopolymer.35.87 | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 87 | |
dc.source.endpage | 93 | |
dc.source.journal | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | |
dc.source.issue | 1 | |
dc.source.volume | 35 | |
imec.availability | Under review |
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