Notice
This item has not yet been validated by imec staff.
Notice
This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/41569.4
In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor
dc.contributor.author | Clerix, Jan-Willem J. | |
dc.contributor.author | Dianat, Golnaz | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Parsons, Gregory N. | |
dc.date.accessioned | 2023-05-05T20:44:17Z | |
dc.date.available | 2023-05-05T20:44:17Z | |
dc.date.issued | 2023-MAY | |
dc.identifier.issn | 0734-2101 | |
dc.identifier.other | WOS:000967842100001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41569 | |
dc.source | WOS | |
dc.title | In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor | |
dc.type | Journal article | |
dc.contributor.imecauthor | Clerix, Jan-Willem J. | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
dc.identifier.doi | 10.1116/6.0002493 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | |
dc.source.issue | 3 | |
dc.source.volume | 41 | |
imec.availability | Under review |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |