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In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor

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370 since deposited on 2023-05-05
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Acq. date: 2026-01-09

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370 since deposited on 2023-05-05
27last month
3last week
Acq. date: 2026-01-09

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989 since deposited on 2023-05-05
1last month
Acq. date: 2026-01-09

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