Publication:
In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor
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353 since deposited on 2023-05-05
65last month
11last week
Acq. date: 2025-12-15
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988 since deposited on 2023-05-05
2last month
Acq. date: 2025-12-15
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