In-depth static and low frequency noise assessment of p-channel gate-all-around vertically stacked silicon nanosheets
dc.contributor.author | Cretu, B. | |
dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Simoen, Eddy | |
dc.date.accessioned | 2023-07-03T12:37:48Z | |
dc.date.available | 2023-06-11T19:49:45Z | |
dc.date.available | 2023-07-03T12:37:48Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 0038-1101 | |
dc.identifier.other | WOS:000990657100001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41711.2 | |
dc.source | WOS | |
dc.title | In-depth static and low frequency noise assessment of p-channel gate-all-around vertically stacked silicon nanosheets | |
dc.type | Journal article | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.identifier.doi | 10.1016/j.sse.2023.108591 | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 108591 | |
dc.source.endpage | na | |
dc.source.journal | SOLID-STATE ELECTRONICS | |
dc.source.issue | March | |
dc.source.volume | 201 | |
imec.availability | Published - imec |
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