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Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers
dc.contributor.author | Pound-Lana, Gwenaelle | |
dc.contributor.author | Bezard, Philippe | |
dc.contributor.author | Petit-Etienne, Camille | |
dc.contributor.author | Cavalaglio, Sebastien | |
dc.contributor.author | Cunge, Gilles | |
dc.contributor.author | Cabannes-Boue, Benjamin | |
dc.contributor.author | Fleury, Guillaume | |
dc.contributor.author | Chevalier, Xavier | |
dc.contributor.author | Zelsmann, Marc | |
dc.date.accessioned | 2023-06-20T10:36:42Z | |
dc.date.available | 2023-06-20T10:36:42Z | |
dc.date.issued | 2021-OCT 20 | |
dc.identifier.issn | 1944-8244 | |
dc.identifier.other | WOS:000710924900083 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41957 | |
dc.source | WOS | |
dc.title | Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers | |
dc.type | Journal article | |
dc.contributor.imecauthor | Bezard, Philippe | |
dc.contributor.orcidext | Petit-Etienne, Camille::0000-0003-4199-5529 | |
dc.contributor.orcidext | Chevalier, Xavier::0000-0001-7397-7849 | |
dc.identifier.doi | 10.1021/acsami.1c13503 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 49184 | |
dc.source.endpage | 49193 | |
dc.source.journal | ACS APPLIED MATERIALS & INTERFACES | |
dc.identifier.pmid | MEDLINE:34636239 | |
dc.source.issue | 41 | |
dc.source.volume | 13 | |
imec.availability | Under review |