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Dry Resist Metrology Readiness for High-NA EUVL

dc.contributor.authorLorusso, Gian
dc.contributor.authorVan den Heuvel, Dieter
dc.contributor.authorZidan, Mohamed
dc.contributor.authorMoussa, Alain
dc.contributor.authorBeral, Christophe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Silva, Anuja
dc.contributor.authorVerveniotis, Elisseos
dc.contributor.authorHaider, Ali
dc.contributor.authorKondo, Tsuyoshi
dc.contributor.authorShindo, Hiroyuki
dc.contributor.authorEbizuka, Yasushi
dc.contributor.authorIsawa, Miki
dc.date.accessioned2024-04-08T12:32:52Z
dc.date.available2023-07-28T17:39:47Z
dc.date.available2024-04-08T12:32:52Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6099-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001022962000030
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42228.3
dc.sourceWOS
dc.titleDry Resist Metrology Readiness for High-NA EUVL
dc.typeProceedings paper
dc.contributor.imecauthorVan den Heuvel, Dieter
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecVan Den Heuvel, Dieter::0009-0008-6879-2178
dc.contributor.orcidimecLorusso, Gian::0000-0003-3498-5082
dc.identifier.doi10.1117/12.2658280
dc.identifier.eisbn978-1-5106-6100-4
dc.source.numberofpages10
dc.source.peerreviewyes
dc.source.beginpageArt. 1249612
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVII
dc.source.conferencedateFEB 27-MAR 02, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12496
imec.availabilityPublished - imec


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320.500.12860/42228.3*2024-04-08T12:29:50Zvalidation by library/open access desk
120.500.12860/422282023-07-28T17:39:47Z

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