Publication:

Dry Resist Metrology Readiness for High-NA EUVL

Date

2023

Proceedings Paper

https://doi.org/10.1117/12.2658280

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Author(s)

;

Van den Heuvel, Dieter

;

;

;

Beral, Christophe

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Charley, Anne-Laure

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De Simone, Danilo

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De Silva, Anuja

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Verveniotis, Elisseos

;

;

Kondo, Tsuyoshi

;

Shindo, Hiroyuki

;

Ebizuka, Yasushi

;

Journal

Proceedings of SPIE

Metrics

880 since deposited on 2023-07-28

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Acq. date: 2026-01-08