Dry Resist Metrology Readiness for High-NA EUVL

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Author(s)

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Van den Heuvel, Dieter

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Beral, Christophe

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Charley, Anne-Laure

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De Simone, Danilo

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De Silva, Anuja

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Verveniotis, Elisseos

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Kondo, Tsuyoshi

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Shindo, Hiroyuki

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Ebizuka, Yasushi

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Journal

Proceedings of SPIE

Metrics

875 since deposited on 2023-07-28

Acq. date: 2025-10-24