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Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density

dc.contributor.authorKohyama, T.
dc.contributor.authorChang, Shu-Hao
dc.contributor.authorDoise, Jan
dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorFoubert, Philippe
dc.date.accessioned2024-03-07T15:08:50Z
dc.date.available2023-07-28T17:40:05Z
dc.date.available2024-03-07T15:08:50Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6103-5
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001022961000003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42241.2
dc.sourceWOS
dc.titleContinued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.identifier.doi10.1117/12.2657509
dc.identifier.eisbn978-1-5106-6104-2
dc.source.numberofpages6
dc.source.peerreviewyes
dc.source.beginpageArt. 124980A
dc.source.conferenceConference on Advances in Patterning Materials and Processes XL
dc.source.conferencedateFEB 27-MAR 01, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12498
imec.availabilityPublished - imec


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220.500.12860/42241.2*2024-03-07T15:06:31Zvalidation by library/open access desk
120.500.12860/422412023-07-28T17:40:05Z

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