Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
dc.contributor.author | Kohyama, T. | |
dc.contributor.author | Chang, Shu-Hao | |
dc.contributor.author | Doise, Jan | |
dc.contributor.author | Kocsis, Michael | |
dc.contributor.author | De Schepper, Peter | |
dc.contributor.author | Foubert, Philippe | |
dc.date.accessioned | 2024-03-07T15:08:50Z | |
dc.date.available | 2023-07-28T17:40:05Z | |
dc.date.available | 2024-03-07T15:08:50Z | |
dc.date.issued | 2023 | |
dc.identifier.isbn | 978-1-5106-6103-5 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:001022961000003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42241.2 | |
dc.source | WOS | |
dc.title | Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.identifier.doi | 10.1117/12.2657509 | |
dc.identifier.eisbn | 978-1-5106-6104-2 | |
dc.source.numberofpages | 6 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 124980A | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XL | |
dc.source.conferencedate | FEB 27-MAR 01, 2023 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12498 | |
imec.availability | Published - imec |
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