dc.contributor.author | Samanta, Suprakash | |
dc.contributor.author | Jin, Seungwan | |
dc.contributor.author | Lee, Chan-Hee | |
dc.contributor.author | Lee, Seong-Soo | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Kim, Tae-Gon | |
dc.contributor.author | Park, Jin-Goo | |
dc.date.accessioned | 2023-11-06T11:00:36Z | |
dc.date.available | 2023-08-02T17:18:15Z | |
dc.date.available | 2023-11-06T11:00:36Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1369-8001 | |
dc.identifier.other | WOS:001024142600001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42256.2 | |
dc.source | WOS | |
dc.title | Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices | |
dc.type | Journal article | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.orcidimec | Struyf, Herbert::0000-0002-6782-5424 | |
dc.identifier.doi | 10.1016/j.mssp.2023.107469 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 07469 | |
dc.source.endpage | na | |
dc.source.journal | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | |
dc.source.issue | July | |
dc.source.volume | 161 | |
imec.availability | Published - imec | |