dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | De Coster, Hanne | |
dc.contributor.author | Dochain, Denis | |
dc.contributor.author | Nurekeyeva, Kunsulu | |
dc.contributor.author | Conlan, Shona | |
dc.contributor.author | Nsimba, Anthony | |
dc.contributor.author | Wostyn, Kurt | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.date.accessioned | 2023-10-13T07:11:28Z | |
dc.date.available | 2023-08-10T17:37:00Z | |
dc.date.available | 2023-10-13T07:11:28Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.other | WOS:001037175400001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42310.2 | |
dc.source | WOS | |
dc.title | Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | De Coster, Hanne | |
dc.contributor.imecauthor | Wostyn, Kurt | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.contributor.orcidimec | De Coster, Hanne::0000-0002-5968-7703 | |
dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
dc.contributor.orcidimec | Altamirano Sanchez, Efrain::0000-0003-3235-6055 | |
dc.date.embargo | 9999-12-31 | |
dc.identifier.doi | 10.1016/j.mee.2023.112058 | |
dc.source.numberofpages | 5 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 112058 | |
dc.source.endpage | na | |
dc.source.journal | MICROELECTRONIC ENGINEERING | |
dc.source.issue | 15 July | |
dc.source.volume | 279 | |
imec.availability | Published - imec | |