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Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch
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Authors
Vereecke, Guy
;
De Coster, Hanne
;
Dochain, Denis
;
Nurekeyeva, Kunsulu
;
Conlan, Shona
;
Nsimba, Anthony
;
Wostyn, Kurt
;
Altamirano Sanchez, Efrain
DOI
10.1016/j.mee.2023.112058
ISSN
0167-9317
Issue
15 July
Journal
MICROELECTRONIC ENGINEERING
Volume
279
Title
Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch
Publication type
Journal article
Embargo date
9999-12-31
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2
20.500.12860/42310.2
*
2023-10-13T07:09:29Z
validation by library/open access desk
1
20.500.12860/42310
2023-08-10T17:37:00Z
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