dc.contributor.author | Chery, Emmanuel | |
dc.contributor.author | Brady-Boyd, Anita | |
dc.contributor.author | Bhatia, Ritwik | |
dc.contributor.author | Pinho, Nelson | |
dc.contributor.author | Slabbekoorn, John | |
dc.contributor.author | Armini, Silvia | |
dc.contributor.author | Sundaram, Ganesh | |
dc.contributor.author | Beyne, Eric | |
dc.date.accessioned | 2023-12-14T12:39:15Z | |
dc.date.available | 2023-09-03T17:38:58Z | |
dc.date.available | 2023-12-14T12:39:15Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1047-4838 | |
dc.identifier.other | WOS:001051761000002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42457.2 | |
dc.source | WOS | |
dc.title | Inorganic Capping Layers in RDL Technologies: Process Advantages and Reliability | |
dc.type | Journal article | |
dc.contributor.imecauthor | Chery, Emmanuel | |
dc.contributor.imecauthor | Pinho, Nelson | |
dc.contributor.imecauthor | Slabbekoorn, John | |
dc.contributor.imecauthor | Armini, Silvia | |
dc.contributor.imecauthor | Beyne, Eric | |
dc.contributor.orcidimec | Chery, Emmanuel::0000-0002-2526-3873 | |
dc.contributor.orcidimec | Armini, Silvia::0000-0003-0578-3422 | |
dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
dc.contributor.orcidimec | Slabbekoorn, John::0000-0002-6098-8618 | |
dc.contributor.orcidimec | Pinho, Nelson::0000-0002-0701-5921 | |
dc.date.embargo | 2024-02-15 | |
dc.identifier.doi | 10.1007/s11837-023-06015-x | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 5096 | |
dc.source.endpage | 5102 | |
dc.source.journal | JOM | |
dc.source.issue | 12 | |
dc.source.volume | 75 | |
imec.availability | Published - open access | |
dc.description.wosFundingText | The authors would like to express their gratitude to the different imec teams involved in this study. Contributions from imec's 3D IIAP program are deeply acknowledged. Special thanks for the numerous FIB cross-section requests handled by Dr. Olivier Richard and Ms. Chris Drijbooms. Sincere thanks should go to JSR Corporation and JSR Micro N.V. for providing the photosensitive polymer used in this study. The support of A. Hiro and H. Noda is deeply recognized. | |