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Study on Alternative Dipole Material Wet Clean by pH Controlled Functional Water

dc.contributor.authorTanaka, Yoichi
dc.contributor.authorGan, Nobuko
dc.contributor.authorOgawa, Yuuichi
dc.contributor.authorIino, Hideaki
dc.contributor.authorHomkar, Suvidyakumar
dc.contributor.authorChang, Ren-Jie
dc.contributor.authorAlessio Verni, Giuseppe
dc.contributor.authorGivens, Michael
dc.contributor.authorLai, Ju Geng
dc.contributor.authorPacco, Antoine
dc.contributor.authorBrus, Stephan
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorOniki, Yusuke
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2025-02-10T13:08:00Z
dc.date.available2023-09-05T21:42:34Z
dc.date.available2025-02-10T13:08:00Z
dc.date.issued2023-08
dc.identifier.issn1012-0394
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42470.2
dc.titleStudy on Alternative Dipole Material Wet Clean by pH Controlled Functional Water
dc.typeProceedings paper
dc.contributor.imecauthorTanaka, Yoichi
dc.contributor.imecauthorHomkar, Suvidyakumar
dc.contributor.imecauthorChang, Ren-Jie
dc.contributor.imecauthorAlessio Verni, Giuseppe
dc.contributor.imecauthorGivens, Michael
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecPacco, Antoine::0000-0001-6330-5053
dc.contributor.orcidimecBrus, Stephan::0000-0003-3554-0640
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecAltamirano Sanchez, Efrain::0000-0003-3235-6055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecArimura, Hiroaki::0000-0002-3138-708X
dc.contributor.orcidimecHolsteyns, Frank::0009-0002-2123-452X
dc.date.embargo9999-12-31
dc.identifier.doihttps://doi.org/10.4028/p-QqI9w5
dc.source.numberofpages5
dc.source.peerreviewyes
dc.subject.disciplineElectrical & electronic engineering
dc.source.beginpage69
dc.source.endpage73
dc.source.conferenceUCPSS - 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces
dc.source.conferencedateSeptember 2023
dc.source.conferencelocationBrugge
dc.source.journalSolid State Phenomena Vol. 346
imec.availabilityPublished - imec


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