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Role of the GaN-on-Si Epi-Stack on ?R-ON Caused by Back-Gating Stress

dc.contributor.authorMillesimo, M.
dc.contributor.authorBorga, Matteo
dc.contributor.authorValentini, L.
dc.contributor.authorBakeroot, B.
dc.contributor.authorPosthuma, Niels
dc.contributor.authorVohra, Anurag
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorFiegna, C.
dc.contributor.authorTallarico, A. N.
dc.date.accessioned2023-12-07T11:12:46Z
dc.date.available2023-09-23T18:03:45Z
dc.date.available2023-12-07T11:12:46Z
dc.date.issued2023
dc.identifier.issn0018-9383
dc.identifier.otherWOS:001063640800001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42584.2
dc.sourceWOS
dc.titleRole of the GaN-on-Si Epi-Stack on ?R-ON Caused by Back-Gating Stress
dc.typeJournal article
dc.contributor.imecauthorBorga, Matteo
dc.contributor.imecauthorPosthuma, Niels
dc.contributor.imecauthorVohra, Anurag
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecBorga, Matteo::0000-0003-3087-6612
dc.contributor.orcidimecPosthuma, Niels::0000-0002-6029-1909
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.identifier.doi10.1109/TED.2023.3304272
dc.source.numberofpages7
dc.source.peerreviewyes
dc.source.beginpage5203
dc.source.endpage5209
dc.source.journalIEEE TRANSACTIONS ON ELECTRON DEVICES
dc.source.issue10
dc.source.volume70
imec.availabilityPublished - imec
dc.description.wosFundingTextThis work was supported in part by Intelligent Reliability 4.0 (iRel40), iRel40is a European co-funded innovation project that has been granted by the Electronics Components and Systems for European Leadership (ECSEL) Joint Undertaking (JU) under Grant 876659; in part by the Horizon 2020 Research Programme and participating countries; and in part by National Funding which is provided by Germany, including the Free States of Saxony and Thuringia, Austria, Belgium, Finland, France, Italy, The Netherlands, Slovakia, Spain, Sweden, and Turkey. The review of this article was arranged by Editor W. Saito.


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220.500.12860/42584.2*2023-12-07T11:10:13Zvalidation by library/open access desk
120.500.12860/425842023-09-23T18:03:45Z

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