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Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces

dc.contributor.authorDe Witte, Hilde
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDouglas, M.
dc.contributor.authorConard, Thierry
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorGijbels, Renaat
dc.date.accessioned2021-10-14T12:50:43Z
dc.date.available2021-10-14T12:50:43Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4289
dc.sourceIIOimport
dc.titleEvaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces
dc.typeJournal article
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1915
dc.source.endpage1919
dc.source.journalJournal of the Electrochemical Society
dc.source.issue5
dc.source.volume147
imec.availabilityPublished - open access


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