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Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability

dc.contributor.authorPinho, Nelson
dc.contributor.authorChery, Emmanuel
dc.contributor.authorBhatia, Ritwik
dc.contributor.authorSundaram, Ganesh
dc.contributor.authorSlabbekoorn, John
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorMiller, Andy
dc.contributor.authorBeyne, Eric
dc.date.accessioned2024-05-27T12:37:59Z
dc.date.available2023-10-24T17:34:31Z
dc.date.available2024-05-27T12:37:59Z
dc.date.issued2023
dc.identifier.issn0569-5503
dc.identifier.otherWOS:001047624100337
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42943.2
dc.sourceWOS
dc.titleInorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability
dc.typeProceedings paper
dc.contributor.imecauthorPinho, Nelson
dc.contributor.imecauthorChery, Emmanuel
dc.contributor.imecauthorSlabbekoorn, John
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecChery, Emmanuel::0000-0002-2526-3873
dc.contributor.orcidimecSlabbekoorn, John::0000-0002-6098-8618
dc.contributor.orcidimecKrishtab, Mikhail::0000-0001-6215-8506
dc.contributor.orcidimecMiller, Andy::0000-0001-7048-2242
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.contributor.orcidimecPinho, Nelson::0000-0002-0701-5921
dc.identifier.doi10.1109/ECTC51909.2023.00350
dc.identifier.eisbn979-8-3503-3498-2
dc.source.numberofpages6
dc.source.peerreviewyes
dc.source.beginpage2040
dc.source.endpage2045
dc.source.conferenceIEEE 73rd Electronic Components and Technology Conference (ECTC)
dc.source.conferencedateMAY 30-JUN 02, 2023
dc.source.conferencelocationOrlando
dc.source.journalN/A
imec.availabilityPublished - imec


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220.500.12860/42943.2*2024-05-27T12:35:05Zvalidation by library/open access desk
120.500.12860/429432023-10-24T17:34:31Z

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