CoSi2 formation in the Ti/Co/SiO2/Si system
dc.contributor.author | Detavernier, C. | |
dc.contributor.author | Van Meirhaeghe, R. L. | |
dc.contributor.author | Cardon, F. | |
dc.contributor.author | Maex, Karen | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Zhu, S. Y. | |
dc.date.accessioned | 2021-10-14T12:54:39Z | |
dc.date.available | 2021-10-14T12:54:39Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4337 | |
dc.source | IIOimport | |
dc.title | CoSi2 formation in the Ti/Co/SiO2/Si system | |
dc.type | Journal article | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.source.peerreview | no | |
dc.source.beginpage | 133 | |
dc.source.endpage | 140 | |
dc.source.journal | J. Appl. Physics | |
dc.source.issue | 1 | |
dc.source.volume | 88 | |
imec.availability | Published - imec |
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