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Conference contributions
Analysis of the etch rate limiting steps in dry etching of tungsten in fluorine containing plasmas
Publication:
Analysis of the etch rate limiting steps in dry etching of tungsten in fluorine containing plasmas
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Date
1994
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verdonck, Patrick
;
Swart, J.
;
Brasseur, Guy
;
De Geyter, Pascal
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Abstract
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2029
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Acq. date: 2025-12-16
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2029
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-16
Citations