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Litho Process Development for Pillars to Enable High Density 4F<SUP>2</SUP> Memory Cells at 34nm Pitch

dc.contributor.authorPak, Murat
dc.contributor.authorDauendorffer, A.
dc.contributor.authorNafus, K.
dc.contributor.authorDas, Arijit
dc.contributor.authorHasan, Mahmudul
dc.contributor.authorRincon Delgadillo, Paulina
dc.date.accessioned2024-05-23T12:25:06Z
dc.date.available2024-01-13T17:47:51Z
dc.date.available2024-05-23T12:25:06Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001125089900003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43407.2
dc.sourceWOS
dc.titleLitho Process Development for Pillars to Enable High Density 4F<SUP>2</SUP> Memory Cells at 34nm Pitch
dc.typeProceedings paper
dc.contributor.imecauthorPak, Murat
dc.contributor.imecauthorDas, Arijit
dc.contributor.imecauthorHasan, Mahmudul
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.orcidimecPak, Murat::0009-0002-5784-619X
dc.identifier.doi10.1117/12.2686265
dc.identifier.eisbn978-1-5106-6749-5
dc.source.numberofpages11
dc.source.peerreviewyes
dc.source.beginpageArt. 1275004
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12750
imec.availabilityPublished - imec
dc.description.wosFundingTextThe authors from imec and TEL wish to thank the imec AP department, MRAM program members and the involved partners for their support.


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220.500.12860/43407.2*2024-05-23T12:20:47Zvalidation by library/open access desk
120.500.12860/434072024-01-13T17:47:51Z

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