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dc.contributor.authorMandal, Akhilesh Kumar
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorRahnemaihaghighi, Negin
dc.contributor.authorRobson, Max
dc.contributor.authorClaessens, Niels
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorJourdan, Nicolas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2024-09-26T14:10:21Z
dc.date.available2024-01-23T18:29:31Z
dc.date.available2024-09-26T14:10:21Z
dc.date.issued2024
dc.identifier.issn2365-709X
dc.identifier.otherWOS:001141978900001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43444.2
dc.sourceWOS
dc.titleSelectivity and Growth Rate Modulations for Ruthenium Area-selective Deposition by Co-Reagent and Nanopattern Design
dc.typeJournal article
dc.contributor.imecauthorMandal, Akhilesh Kumar
dc.contributor.imecauthorClaessens, Niels
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorRahnemaihaghighi, Negin
dc.contributor.orcidimecMandal, Akhilesh Kumar::0000-0002-7974-252X
dc.contributor.orcidimecClaessens, Niels::0000-0002-8863-9532
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecJourdan, Nicolas::0009-0005-4798-1736
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.identifier.doi10.1002/admt.202301820
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.beginpageArt. 2301820
dc.source.endpageN/A
dc.source.journalADVANCED MATERIALS TECHNOLOGIES
dc.source.issue5
dc.source.volume9
imec.availabilityPublished - imec


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