Publication:

Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness

Date

2023
Journal article
https://doi.org/10.1117/1.jmm.22.4.044801
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Author(s)

Ohtomi, Eisuke
;
Philipsen, Vicky  
;
Welling, Ulrich
;
Melvin III, Lawrence S.
;
Takahata, Yosuke
;
Tanaka, Yusuke
;
De Simone, Danilo  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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855 since deposited on 2024-02-27
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Acq. date: 2026-10-08

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