dc.contributor.author | Ohtomi, Eisuke | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Welling, Ulrich | |
dc.contributor.author | Melvin III, Lawrence S. | |
dc.contributor.author | Takahata, Yosuke | |
dc.contributor.author | Tanaka, Yusuke | |
dc.contributor.author | De Simone, Danilo | |
dc.date.accessioned | 2024-03-25T10:20:12Z | |
dc.date.available | 2024-02-27T17:42:53Z | |
dc.date.available | 2024-03-25T10:20:12Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:001134890300015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43597.2 | |
dc.source | WOS | |
dc.title | Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness | |
dc.type | Journal article | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.1117/1.JMM.22.4.044801 | |
dc.source.numberofpages | 14 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 044801 | |
dc.source.endpage | N/A | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 4 | |
dc.source.volume | 22 | |
imec.availability | Published - imec | |