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Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond

dc.contributor.authorErcken, Monique
dc.contributor.authorMoelants, Myriam
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorMasuda, Seiya
dc.contributor.authorSpiess, Walter
dc.contributor.authorPawlowski, G.
dc.date.accessioned2021-10-14T12:56:57Z
dc.date.available2021-10-14T12:56:57Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4361
dc.sourceIIOimport
dc.titleOptimization of an advanced positive tone DUV photoresist towards 150nm and beyond
dc.typeJournal article
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorMoelants, Myriam
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage443
dc.source.endpage447
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume53
imec.availabilityPublished - imec


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