Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond

Metadata

Show full item record

Authors

Ercken, Monique; Moelants, Myriam; Vandenberghe, Geert; Goethals, Mieke; Ronse, Kurt; Masuda, Seiya; Spiess, Walter; Pawlowski, G.

Issue

1_4

Journal

Microelectronic Engineering

Volume

53

Title

Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond

Publication type

Journal article

Collections

Articles