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Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
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Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
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Date
2000
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ercken, Monique
;
Moelants, Myriam
;
Vandenberghe, Geert
;
Goethals, Mieke
;
Ronse, Kurt
;
Masuda, Seiya
;
Spiess, Walter
;
Pawlowski, G.
Journal
Microelectronic Engineering
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1985
since deposited on 2021-10-14
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last month
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last week
Acq. date: 2026-02-28
Citations
Statistics
Views
1985
since deposited on 2021-10-14
1
last month
1
last week
Acq. date: 2026-02-28
Citations