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Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
Publication:
Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
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Date
2000
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ercken, Monique
;
Moelants, Myriam
;
Vandenberghe, Geert
;
Goethals, Mieke
;
Ronse, Kurt
;
Masuda, Seiya
;
Spiess, Walter
;
Pawlowski, G.
Journal
Microelectronic Engineering
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1983
since deposited on 2021-10-14
Acq. date: 2025-12-14
Citations
Metrics
Views
1983
since deposited on 2021-10-14
Acq. date: 2025-12-14
Citations