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dc.contributor.authorFinders, Jo
dc.contributor.authorvan Schoot, J.
dc.contributor.authorVanoppen, Peter
dc.contributor.authorDusa, M.
dc.contributor.authorSocha, B.
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T12:57:40Z
dc.date.available2021-10-14T12:57:40Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4368
dc.sourceIIOimport
dc.titleKrF lithography for 130nm
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage192
dc.source.endpage205
dc.source.conferenceOptical Microlithography XIII
dc.source.conferencedate1/03/2000
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4000


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