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Pattern deformation mitigation for EUV photoresists using wafer backside cleaning techniques
Publication:
Pattern deformation mitigation for EUV photoresists using wafer backside cleaning techniques
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Date
2024
Journal article
https://doi.org/10.35848/1347-4065/ad2bbc
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Harumoto, Masahiko
;
dos Santos, Andreia Figueiredo
;
Zanders, Wesley
;
Caron, Elke
;
Vandereyken, Jelle
Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
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60
since deposited on 2024-04-01
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Acq. date: 2026-01-06
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Views
60
since deposited on 2024-04-01
2
last month
Acq. date: 2026-01-06
Citations