New wet cleaning technology for highly reliable thin oxides
| dc.contributor.author | Verhaverbeke, Steven | |
| dc.date.accessioned | 2021-09-29T12:52:00Z | |
| dc.date.available | 2021-09-29T12:52:00Z | |
| dc.date.issued | 1994 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/438 | |
| dc.source | IIOimport | |
| dc.title | New wet cleaning technology for highly reliable thin oxides | |
| dc.type | Oral presentation | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.conference | Semicon/West : Large Diameter Silicon Wafer Cleaning Technology | |
| dc.source.conferencedate | 18/07/1994 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| imec.availability | Published - open access |