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Implementation of ArF resist processes for 130nm and below
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Authors
Goethals, Mieke
;
Van Roey, Frieda
;
Vandenberghe, Geert
;
Jaenen, Patrick
;
Pollers, Ingrid
;
Pollentier, Ivan
;
Ronse, Kurt
Issue
4
Journal
Journal of Photopolymer Science and Technology
Volume
13
Title
Implementation of ArF resist processes for 130nm and below
Publication type
Journal article
Embargo date
9999-12-31
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