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Implementation of ArF resist processes for 130nm and below

dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJaenen, Patrick
dc.contributor.authorPollers, Ingrid
dc.contributor.authorPollentier, Ivan
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-14T13:00:44Z
dc.date.available2021-10-14T13:00:44Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4398
dc.sourceIIOimport
dc.titleImplementation of ArF resist processes for 130nm and below
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage635
dc.source.endpage644
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue4
dc.source.volume13
imec.availabilityPublished - open access


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