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Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography

dc.contributor.authorCanga, Eren
dc.contributor.authorBlanco, Victor
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorTabery, Cyrus
dc.contributor.authorZacca, Gabriel
dc.contributor.authorShamma, Nader
dc.contributor.authorKam, Benjamin
dc.contributor.authorBrouri, Mohand
dc.date.accessioned2024-08-26T08:55:00Z
dc.date.available2024-06-15T17:25:54Z
dc.date.available2024-08-26T08:55:00Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-7216-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001224296200048
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44052.2
dc.sourceWOS
dc.titleOverlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography
dc.typeProceedings paper
dc.contributor.imecauthorCanga, Eren
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecCanga, Eren::0000-0002-2322-8070
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.date.embargo2024-04-09
dc.identifier.doi10.1117/12.3010115
dc.identifier.eisbn978-1-5106-7217-8
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpageArt. 129551R
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVIII
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12955
imec.availabilityPublished - open access


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220.500.12860/44052.2*2024-08-26T08:53:00Zvalidation by library/open access desk
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