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Chemical and structural analysis of etching rsidue layers in semiconductor devices with energy filtering transmission electron spectroscopy

dc.contributor.authorHens, S.
dc.contributor.authorVan Landuyt, J.
dc.contributor.authorBender, Hugo
dc.contributor.authorBoullaert, W.
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-14T13:03:17Z
dc.date.available2021-10-14T13:03:17Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4422
dc.sourceIIOimport
dc.titleChemical and structural analysis of etching rsidue layers in semiconductor devices with energy filtering transmission electron spectroscopy
dc.typeOral presentation
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Electronic Materials & European Materials Research Society Spring Meeting. Symposium M: Advanced Cha
dc.source.conferencelocation
imec.availabilityPublished - imec


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