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Variation in the fixed charge density of SiOx/ZrO2 gate dielectric stacks during postdeposition oxidation
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Variation in the fixed charge density of SiOx/ZrO2 gate dielectric stacks during postdeposition oxidation
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Date
2000
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Houssa, Michel
;
Afanas'ev, V. V.
;
Stesmans, Andre
;
Heyns, Marc
Journal
Applied Physics Letters
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1975
since deposited on 2021-10-14
2
last month
Acq. date: 2026-01-11
Citations
Metrics
Views
1975
since deposited on 2021-10-14
2
last month
Acq. date: 2026-01-11
Citations