dc.contributor.author | Vermeire, Bert | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Mac Geary, M. J. | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Lubbers, A. | |
dc.date.accessioned | 2021-09-29T12:52:17Z | |
dc.date.available | 2021-09-29T12:52:17Z | |
dc.date.issued | 1994 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/443 | |
dc.source | IIOimport | |
dc.title | Effect of different chlorine sources during gate oxidation | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 143 | |
dc.source.endpage | 146 | |
dc.source.conference | Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
dc.source.conferencedate | 19/09/1994 | |
dc.source.conferencelocation | Brugge belgium | |
imec.availability | Published - open access | |