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In situ HDP-CVD process monitoring based on quadrupole mass spectrometry

dc.contributor.authorHughes, Carolyn
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T13:05:21Z
dc.date.available2021-10-14T13:05:21Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4440
dc.sourceIIOimport
dc.titleIn situ HDP-CVD process monitoring based on quadrupole mass spectrometry
dc.typeOral presentation
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceAdvanced Equipment Control/Advanced Process Control Workshop /Europe
dc.source.conferencedate30/03/2000
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - open access


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