Show simple item record

Reticle imaging and metrology using a CD-SEM at IMEC

dc.contributor.authorJames, A.
dc.contributor.authorFelten, F.
dc.contributor.authorPolli, M.
dc.contributor.authorEngland, J.
dc.contributor.authorMarschner, Thomas
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-14T13:06:08Z
dc.date.available2021-10-14T13:06:08Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4447
dc.sourceIIOimport
dc.titleReticle imaging and metrology using a CD-SEM at IMEC
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage128
dc.source.endpage133
dc.source.conference16th European Conferenc on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencelocation
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3996


Files in this item

Thumbnail
Name:
4441.pdf
Size:
1.058Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record