Show simple item record

Formation of (Nd,Y)-silicides by sequential channeled implantation of Y and Nd ions

dc.contributor.authorJin, Sing
dc.contributor.authorBender, Hugo
dc.contributor.authorWu, Ming Fang
dc.contributor.authorVantomme, Andre
dc.contributor.authorLangouche, G.
dc.date.accessioned2021-10-14T13:07:14Z
dc.date.available2021-10-14T13:07:14Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4457
dc.sourceIIOimport
dc.titleFormation of (Nd,Y)-silicides by sequential channeled implantation of Y and Nd ions
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVantomme, Andre
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage349
dc.source.endpage354
dc.source.journalNuclear Instruments and Methods B
dc.source.issue3
dc.source.volumeB160
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
4451.pdf
Size:
1.429Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record